Effect of reactor geometry and growth parameters on the uniformity and material properties of grown by hydride vapor-phase epitaxy
- 1 December 1997
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 182 (3-4) , 233-240
- https://doi.org/10.1016/s0022-0248(97)00375-8
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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