Effect of preannealing on the level of second-harmonic generation and defect sites achieved in poled low-water fused silica
- 1 November 1995
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America B
- Vol. 12 (11) , 2037-2045
- https://doi.org/10.1364/josab.12.002037
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 21 references indexed in Scilit:
- Measurement of the linear electro-optic coefficient in poled amorphous silicaOptics Letters, 1994
- Dynamics of second-harmonic generation in fused silicaJournal of the Optical Society of America B, 1994
- Erasure of thermally poled second-order nonlinearity in fused silica by electron implantationOptics Letters, 1993
- Influence of the OH Content on Second Harmonic Generation from Electrically Polarized SiO2 GlassesJapanese Journal of Applied Physics, 1993
- On the charge storage and decay mechanism in silicon dioxide electretsIEEE Transactions on Electrical Insulation, 1992
- Large second-order nonlinearity in poled fused silicaOptics Letters, 1991
- Reduction of electron trapping in silicon dioxide by high-temperature nitrogen annealJournal of Applied Physics, 1981
- Electrochemical Charging of Thermal SiO2 Films by Injected Electron CurrentsJournal of Applied Physics, 1971
- Maker Fringes: A Detailed Comparison of Theory and Experiment for Isotropic and Uniaxial CrystalsJournal of Applied Physics, 1970
- AVALANCHE INJECTION CURRENTS AND CHARGING PHENOMENA IN THERMAL SiO2Applied Physics Letters, 1969