Efficient storage, computation, and exposure of computer-generated holograms by electron-beam lithography

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Abstract
An efficient storage format was developed for computer-generated holograms for use in electron-beam lithography. This method employs run-length encoding and Lempel–Ziv–Welch compression and succeeds in exposing holograms that were previously infeasible owing to the hologram’s tremendous pattern-data file size. These holograms also require significant computation; thus the algorithm was implemented on a parallel computer, which improved performance by 2 orders of magnitude. The decompression algorithm was integrated into the Cambridge electron-beam machine’s front-end processor.