Modeling of plasma-induced self-healing in organic dielectrics

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Abstract
Plasma‐induced self‐healing in organic dielectrics, which is of extremely great importance for capacitor technology, is dependent, in a complicated manner, upon electrical and physicochemical processes, which cannot be determined by metrology. Accordingly, a theoretical model was developed which describes the spatiotemporal distribution of potential and current in the plasma of a self‐healing breakdown, the formation of gas as a consequence of decomposition of material, and the consequent graphite deposition in the insulating areas. In this way it is also possible to compute the insulating areas as well as the entire gas formation as a function of voltage, capacitance, and thickness of the metal electrodes, and the limits for reliable self‐healing.