Evaluation of tetra-alkylchromium precursors for organometallic chemical vapour deposition I. films grown using Cr[CH2C(CH3)3]4
- 1 January 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 207 (1-2) , 82-89
- https://doi.org/10.1016/0040-6090(92)90106-l
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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