Structural characterization of chromium carbide coatings deposited at low temperature by low pressure chemical vapour decomposition using dicumene chromium
- 1 February 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 41 (1) , 51-61
- https://doi.org/10.1016/0257-8972(90)90129-z
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Structures and composition before and after annealing of coatings in the Cr–C binary system produced by reactive physical depositionJournal of Vacuum Science & Technology A, 1985
- Stacking faults in chromium, iron and vanadium mixed carbides of the type M7C3Journal of Materials Science, 1980
- Characterization of thick chromium-carbon and chromium-nitrogen films deposited by hollow cathode dischargeThin Solid Films, 1977
- Organometallic derivatives of the transition elements. I. Carbon-13 nuclear magnetic resonance studies of bis(arene)chromium(0) compoundsInorganic Chemistry, 1976
- Low Temperature Deposition of Metal Nitrides by Thermal Decomposition of Organometallic CompoundsJournal of the Electrochemical Society, 1975
- Mechanisms of Decomposition of Organochromium Compounds in the CVD Process. Cycloheptatriene Chromium TricarbonylJournal of the Electrochemical Society, 1975
- The growth of hetero-epitaxial SiC films by pyrolysis of various alkyl-silicon compoundsJournal of Crystal Growth, 1974
- Influence of Deposition Temperature on Composition and Growth Rate of GaAsx P1−x LayersJournal of Applied Physics, 1972
- Chromium Deposition from Dicumene-Chromium to Form Metal-Semiconductor DevicesJournal of the Electrochemical Society, 1971
- Infrared absorption spectra of metal carbides, nitrides and sulfidesBUNSEKI KAGAKU, 1968