The Colloid Chemical Approach to Nanostructured Materials**
- 1 July 1995
- journal article
- research article
- Published by Wiley in Advanced Materials
- Vol. 7 (7) , 607-632
- https://doi.org/10.1002/adma.19950070703
Abstract
No abstract availableKeywords
This publication has 156 references indexed in Scilit:
- Ultra-thin particulate films prepared from capped and uncapped reverse-micelle-entrapped silver particlesJournal of the Chemical Society, Faraday Transactions, 1995
- Fluorescence activation and surface-state reactions of size-quantized cadmium sulfide particles in Langmuir-Blodgett filmsThe Journal of Physical Chemistry, 1994
- Build-up of polymeric molecular deposition films bearing mesogenic groupsThin Solid Films, 1994
- Spreading of hydrophobic silica beads at water—air interfacesColloids and Surfaces A: Physicochemical and Engineering Aspects, 1993
- Molecular beam epitaxy of III–V semiconductorsCritical Reviews in Solid State and Materials Sciences, 1993
- Semiconductor particles formed at monolayer surfacesLangmuir, 1991
- Template-directed semiconductor size quantization at monolayer-water interfaces and between the headgroups of Langmuir-Blodgett filmsLangmuir, 1990
- An X-ray scattering study of lipid monolayers at the air-water interface and on solid supportsThin Solid Films, 1988
- X-Ray Diffraction Studies of Organic Monolayers on the Surface of WaterPhysical Review Letters, 1987
- Solution deposition of thin solid compound films by a successive ionic-layer adsorption and reaction processApplications of Surface Science, 1985