Control of Hydrocarbon Radicals and Amorphous Carbon Film Deposition by Means of RF Whistler Wave Discharge
- 1 June 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (6R)
- https://doi.org/10.1143/jjap.31.1879
Abstract
Hydrocarbon radicals are produced and controlled by using a radio-frequency (RF) whistler wave discharge in a low-pressure region (∼0.1 Pa). Plasma density of 1010-1013 cm-3, at an electron temperature of 2-20 eV is obtained for the discharge of an admixture of Ar and a small amounts of source gases (CH4, C2H2, CO). Densities of CH and H radicals and deposition rate of amorphous carbon:H film increase with electron density, electron temperature and source gas pressure. Both neutral radicals and ionic radicals play an important role in the deposition, and the etching effect of H atoms reduces the deposition rate. A high deposition rate (90 µm/h for CO/Ar discharge) is obtained even for a low-neutral-pressure discharge.Keywords
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