Anomalous Ag Surface Diffusion in Amorphous Se-Ge/Ag Inorganic Resist
- 1 September 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (9) , L649
- https://doi.org/10.1143/jjap.20.l649
Abstract
An anomalous patterning was observed gollowing a double light exposure of Se-Ge/Ag resist. This anomaly is considered to be caused by Ag diffusion from the masked region into the exposed region through an ionic conductive Ag2Se layer. This surface diffusion also explains the edge sharpening effect.Keywords
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