High-power InGaAs-GaAs strained quantum well lasers with InGaP cladding layers on p-type GaAs substrates

Abstract
We report device results from channel guide InGaAs‐GaAs strained quantum well lasers with In0.49Ga0.51P cladding layers (λ L = 980 nm). Channel guide lasers are demonstrated with a new current blocking scheme using a p‐n‐pInGaP junction on a p +‐GaAs substrate. The laser structure is grown by metalorganic vapor phase epitaxy on the channeled n‐InGaP layer. The reverse biased p‐n‐pInGaP junction is shown to be effective in preserving the current blocking properties for InGaAs‐GaAs‐InGaP lasers. The uncoated lasers show cw laser thresholds of 11 mA at RT and high output powers of 125 mW.