New high-resolution charge transfer x-ray and electron beam negative resist
- 1 August 1980
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 37 (3) , 314-316
- https://doi.org/10.1063/1.91918
Abstract
A new class of polymeric negative x‐ray and electron beam resists is described. Polystyrene‐tetrathiafulvalene films doped with a halocarbon acceptor show good sensitivity to x‐rays (D1/2=44 mJ/cm2) and electron beams (D1/2=6 μC/cm2), with high contrast values γ≳2.5, and with no evidence for the classical swelling phenomena. In electron beam exposures at 10 μC/cm2, parallel wall patterns are produced with pattern resolution of 1000 Å or better. Reasons for the improvement in lithographic parameters relative to previous negative resists are briefly discussed.Keywords
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