Generation of Electron Cyclotron Resonance Plasma in the VHF Band
- 1 October 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (10A) , L1860
- https://doi.org/10.1143/jjap.28.l1860
Abstract
A novel processing plasma in the VHF region (144 MHz band) is described. Optical emission spectroscopy has been employed as a diagnostic tool of the plasma. The advantage of the VHF plasma is enhanced in the ECR mode by applying magnetic field. ECR plasma with a large area uniformity has been obtained at a magnetic field of as low as 51 G. By using the ECR mode, the discharge condition has been significantly expanded to a lower pressure range and lower power density region. The ECR-VHF plasma has been successfully applied for the deposition of amorphous silicon films.Keywords
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