Partially dissociative adsorption of water vapor on the Si(111) (7×7) surface
- 9 May 1983
- journal article
- Published by Elsevier in Physics Letters A
- Vol. 95 (6) , 345-346
- https://doi.org/10.1016/0375-9601(83)90037-3
Abstract
No abstract availableKeywords
Funding Information
- Kurata Memorial Hitachi Science and Technology Foundation
- Ministry of Education
This publication has 9 references indexed in Scilit:
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- Localized bond model for H2O chemisorption on silicon surfacesSurface Science, 1981
- The bonding of water molecules to platinum surfacesSurface Science, 1980
- Hydrogen bonding in silicon-hydrogen alloysPhilosophical Magazine Part B, 1978
- Adsorption of water vapor on Si(111) surfacesPhysics Letters A, 1975
- The adsorption of oxygen on a clean silicon surfaceSurface Science, 1973
- Ellipsometric study of adsorption complexes on siliconSurface Science, 1971