Influence of Boron-Doping on Hydrogen Diffusion and Effusion in a-Si:H and a-Si-Alloys
- 1 January 1988
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Structutral and electrical properties of silicon-based amorphous alloysJournal of Non-Crystalline Solids, 1987
- Hydrogen diffusion in amorphous siliconPhilosophical Magazine Part B, 1987
- Hydrogen Incorporation in Amorphous Silicon and Processes of Its ReleasePublished by Springer Nature ,1985
- Effect of boron-doping on the hydrogen evolution from a-Si:H filmsSolid State Communications, 1981
- A SIMS analysis of deuterium diffusion in hydrogenated amorphous siliconApplied Physics Letters, 1978