In situ tensile strength measurement and Weibull analysis of thick film and thin film micromachined polysilicon structures
- 1 January 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 292 (1-2) , 247-254
- https://doi.org/10.1016/s0040-6090(96)09076-1
Abstract
No abstract availableKeywords
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