Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications
- 1 April 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 259 (2) , 181-187
- https://doi.org/10.1016/0040-6090(94)06449-0
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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