Film Thickness Determination from Substrate X-Ray Reflections

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Abstract
A method is given for the determination of the thickness of films using x‐rays diffracted from the substrate. The x‐rays pass through the film and are diffracted by the substrate back to the counter, the intensity being reduced by absorption due to the double transmission through the film. No assumptions need be made about the substrate reflection. Unknown conditions of the substrate are eliminated by measurement of the intensity of two orders of a reflection, or measurement of the intensity of a reflection using two different incident radiations. The method is suitable for all types of film, and is particularly useful in measurements of films containing elements of the substrate for which cases x‐ray fluorescence techniques are of little value. The procedure is illustrated with a measurement of the thickness of zirconium nitride on a zirconium substrate.

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