A SIMS study of nickel deposition on TiO2(100)
- 1 June 1991
- journal article
- Published by Elsevier in Surface Science
- Vol. 249 (1-3) , 194-198
- https://doi.org/10.1016/0039-6028(91)90844-i
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Nickel deposition on TiO2(100): Characterization by AES and SIMSSurface Science, 1989
- Electronic interactions in the rhodium/TiO2 systemJournal of Catalysis, 1988
- Effect of high temperature reduction on the surface composition of and CO chemisorption on Ni/TiO2Applications of Surface Science, 1984
- Surface electronic properties and CO hydrogenation activity of nickel deposited on rutile TiO2(100) as a model supported catalystJournal of Catalysis, 1982
- Pure element sputtering yields using 500–1000 eV argon ionsThin Solid Films, 1981
- Strong metal-support interactions. Group 8 noble metals supported on titanium dioxideJournal of the American Chemical Society, 1978
- Low energy electron diffraction and electron spectroscopy studies of the clean (110) and (100) titanium dioxide (rutile) crystal surfacesSurface Science, 1977
- Probing surface properties with adsorbed metal monolayersJournal of Vacuum Science and Technology, 1976
- Evaluation of concentration-depth profiles by sputtering in SIMS and AESApplied Physics A, 1976
- Die Analyse monomolekularer FestkörperoberflÄchenschichten mit Hilfe der SekundÄrionenemissionThe European Physical Journal A, 1970