Positive Ions in RF Discharge Plasma of CF 4 Gas in a Planar Diode
- 1 July 1996
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 35 (7R)
- https://doi.org/10.1143/jjap.35.4081
Abstract
Positive ions were measured in situ by direct sampling from CF4 discharge space at 13.56 MHz using a quadrupole mass spectrometer. CF3 + is observed predominantly with smaller amounts of CF2 + and CF+. With increasing RF power, both CF2 + and CF+ shift to the lower energy side of CF3 +, and their intensities tend to increase. Such a phenomenon is also observed as controlling the potential of a sampling tip externally. These seem to suggest that CF2 + and CF+ are produced mainly in the sheath region.Keywords
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