Kinetics of NiSi Formation by Solid State Diffusion in Pt/NiCr/Si Via Growth of an Amorphous Cr-Rich Barrier Layer
- 1 January 1990
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- NiSi formation through a semipermeable membrane of amorphous Cr(Ni)Applied Physics Letters, 1991
- Amorphous silicide formation by thermal reaction: A comparison of several metal–silicon systemsJournal of Vacuum Science & Technology A, 1989
- Effects of backsputtering and amorphous silicon capping layer on the formation of TiSi2 in sputtered Ti films on (001)Si by rapid thermal annealingJournal of Applied Physics, 1988
- Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compoundsJournal of Applied Physics, 1984