DLTS analysis of carrier generation transients in thin SOI MOSFETs
- 1 January 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 37 (1) , 262-266
- https://doi.org/10.1109/16.43823
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Accurate technique for CV Measurements on SOI structures excluding parasitic capacitance effectsIEEE Electron Device Letters, 1986
- Determination of minority-carrier generation lifetime in beam-recrystallized silicon-on-insulator structure by using a depletion-mode transistorApplied Physics Letters, 1985
- Electrical Characterization of Crystallized—Silicon Thin FilmsMRS Proceedings, 1985
- The concept of generation and recombination lifetimes in semiconductorsIEEE Transactions on Electron Devices, 1982
- A dual-gate deep-depletion technique for generation lifetime measurementIEEE Transactions on Electron Devices, 1980
- Hot hole effect on surface-state density and minority-carrier generation rates in Si-MOS diodes measured by DLTSIEEE Transactions on Electron Devices, 1980
- Minority-carrier lifetime in dielectrically isolated single-crystal silicon films defined by electrochemical etchingSolid-State Electronics, 1974
- On the determination of minority carrier lifetime from the transient response of an MOS capacitorIEEE Transactions on Electron Devices, 1967
- Carrier Generation and Recombination in P-N Junctions and P-N Junction CharacteristicsProceedings of the IRE, 1957
- Electron-Hole Recombination in GermaniumPhysical Review B, 1952