Characterisation of Ion Implanted and Thin Epitaxial Layer Structures Using Photoluminescence
- 1 January 1988
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Heavily doped silicon studied by luminescence and selective absorptionSolid-State Electronics, 1985
- Photoluminescence from rapid thermal annealed and pulsed-laser-annealed, ion-implanted SiApplied Physics Letters, 1984
- Auger coefficients for highly doped and highly excited siliconApplied Physics Letters, 1977