Separate estimate of crystalline orientations and scattering centers in polycrystals by backscattering technique
- 1 April 1976
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 47 (4) , 1686-1689
- https://doi.org/10.1063/1.322793
Abstract
A novel method using backscattering and channeling techniques is presented to estimate separately two dominant dechanneling factors in polycrystals, that is, spread of crystallite orientations and existence of scattering centers. It is theoretically shown that both factors can independently be estimated by measuring angular dependences of backscattering yield around the channeling axis. The angular dips on Pd2Si layers formed on single‐crystalline Si substrates are measured by using 1–2‐MeV protons, He+, and N+ ions. The channeling measurements using N+ ions are shown to be a useful tool for analysis of polycrystalline layers. By using the above method, crystalline perfection of these layers is also discussed.This publication has 5 references indexed in Scilit:
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- Formation kinetics and structure of Pd2Si films on SiSolid-State Electronics, 1973
- Characterization of polycrystalline layers by channelling measurementsThin Solid Films, 1973
- Alloying of thin palladium films with single crystal and amorphous siliconPhysica Status Solidi (a), 1973
- Channeling Studies in Diamond-Type LatticesPhysical Review B, 1969