Characterization of Ni-Cr thin films by X-ray analysis
- 1 April 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 148 (2) , 209-218
- https://doi.org/10.1016/0040-6090(87)90159-3
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- Effect of ion bombardment during deposition on the x-ray microstructure of thin silver filmsJournal of Vacuum Science & Technology A, 1985
- X-ray diffraction studies of sputtered thin films of platinumJournal of Applied Physics, 1982
- Correlation between electrical properties and AES concentration-depth profiles of NiCr thin filmsThin Solid Films, 1976
- The evaluation of the technology for depositing NiCr resistive filmsThin Solid Films, 1976
- Structural and electrical properties of evaporated Cr-Ni films as a function of gas pressureThin Solid Films, 1973
- The Structure of Electroplated and Vapor-Deposited Copper FilmsJournal of Applied Physics, 1972
- Structural Investigation of Thin FilmsJournal of Vacuum Science and Technology, 1970
- X-Ray Diffraction Study of Vacuum-Evaporated Silver FilmsJournal of Vacuum Science and Technology, 1966
- The effect of composition on the temperature coefficient of resistance of NiCr filmsBritish Journal of Applied Physics, 1965
- Structure and Annealing Behavior of Metal Films Deposited on Substrates near 80 °K: I. Copper Films on GlassJournal of Vacuum Science and Technology, 1965