Abstract
Hall-effect and resistivity measurements have been made on n-type and ultrapure germanium. The n-type material was characterized by measuring the electron mobility μL as a function of temperature down to 100 K at atmospheric pressure. At high pressure, the band structure of germanium becomes similar to that of silicon at atmospheric pressure, making the Δ1C minima accessible to direct electrical investigation. In this siliconlike structure, the electron mobility μΔ was found to increase with temperature T from 800 cm2 V1 S1 at 300 K according to T2.7, indicating that intervalley scattering dominates as in silicon. This contrasts with electron scattering in the L1C minima which is dominated by deformation potential intravalley scattering. An analysis with the values mt*=0.288 and ml*=1.353 gave intervalley coupling constants of 3.7×108 and 2.9×108 eV cm1 for the 430-K (LO) and 320-K (LA) phonons, respectively. Having established μL and μΔ, the resistivity ρ was measured as a function of pressure in ultrapure material at 300 K. It was found to increase exponentially below 25 kbar where the material was n type corresponding to dEL/dP=(4.8±0.2)×106 eV bar1. A p- to n-type transition was observed and beyond 35 kbar, where the material was p type, the resistivity decreased exponentially corresponding to dEΔ/dP=-(2.4±0.4)×106 eV bar1. With the effective-mass values given above, best overall fit was obtained with ΔEL?(hyΔ=0.21±0.01 eV at atmospheric pressure.

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