Electron transport and pressure coefficients associated with theandminima of germanium
- 15 August 1986
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 34 (4) , 2319-2328
- https://doi.org/10.1103/physrevb.34.2319
Abstract
Hall-effect and resistivity measurements have been made on n-type and ultrapure germanium. The n-type material was characterized by measuring the electron mobility as a function of temperature down to 100 K at atmospheric pressure. At high pressure, the band structure of germanium becomes similar to that of silicon at atmospheric pressure, making the minima accessible to direct electrical investigation. In this siliconlike structure, the electron mobility was found to increase with temperature T from 800 at 300 K according to , indicating that intervalley scattering dominates as in silicon. This contrasts with electron scattering in the minima which is dominated by deformation potential intravalley scattering. An analysis with the values =0.288 and =1.353 gave intervalley coupling constants of 3.7× and 2.9× eV for the 430-K (LO) and 320-K (LA) phonons, respectively. Having established and , the resistivity ρ was measured as a function of pressure in ultrapure material at 300 K. It was found to increase exponentially below 25 kbar where the material was n type corresponding to /dP=(4.8±0.2)× eV . A p- to n-type transition was observed and beyond 35 kbar, where the material was p type, the resistivity decreased exponentially corresponding to /dP=-(2.4±0.4)× eV . With the effective-mass values given above, best overall fit was obtained with Δ=0.21±0.01 eV at atmospheric pressure.
Keywords
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