Sol-gel TiO2 films on silicon substrates
- 1 January 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 207 (1-2) , 180-184
- https://doi.org/10.1016/0040-6090(92)90120-z
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Sol-gel synthesis of electrochromic filmsMaterials Science and Engineering: B, 1989
- Morphology and structure of TiO2 thin layers vs. thickness and substrate temperatureThin Solid Films, 1989
- Anodic TiO2 Thin Films: Photoelectrochemical, Electrochemical, and Structural Study of Heat‐Treated and Modified FilmsJournal of the Electrochemical Society, 1989
- Surface modification of a TiO2 film electrode prepared by the sol-gel method and its effect on photoelectrochemical behaviorJournal of Non-Crystalline Solids, 1988
- Electronic Properties of the Interface between Si and TiO2 Deposited at Very Low TemperaturesJapanese Journal of Applied Physics, 1986
- A simple chemical vapour deposition method for depositing thin TiO2 filmsThin Solid Films, 1983
- Structural properties of titanium dioxide films deposited in an rf glow dischargeJournal of Vacuum Science & Technology A, 1983
- Dielectric properties of ion plated titanium oxide thin filmsJournal of Non-Crystalline Solids, 1983
- Chemical deposition of TiO2 layers on GaAsThin Solid Films, 1983
- Antireflective coatings applied from metal–organic derived liquid precursorsApplied Optics, 1979