Sputtering process during ion implantation in glasses: mathematical and physical analysis
- 10 January 1983
- journal article
- Published by IOP Publishing in Journal of Physics C: Solid State Physics
- Vol. 16 (1) , 221-228
- https://doi.org/10.1088/0022-3719/16/1/024
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Radiation Effects of Bombardment of Quartz and Vitreous Silica by 7.5-kev to 59-kev Positive IonsPhysical Review B, 1960
- The cleaning of glass in a glow dischargeBritish Journal of Applied Physics, 1958
- Radiation Effect of Positive Ion Bombardment on GlassJournal of Applied Physics, 1957