Evaluation of channel hot carrier effects in n-MOS transistors at 77 K with the charge pumping technique
- 1 October 1987
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 30 (1-4) , 313-318
- https://doi.org/10.1016/0169-4332(87)90107-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Hot-electron-induced interface state generation in n-channel MOSFET's at 77 KIEEE Transactions on Electron Devices, 1987
- Evaluation of hot carrier degradation of N-channel MOSFET's with the charge pumping techniqueIEEE Electron Device Letters, 1986
- A reliable approach to charge-pumping measurements in MOS transistorsIEEE Transactions on Electron Devices, 1984
- 1 /spl mu/m MOSFET VLSI technology. IV. Hot-electron design constraintsIEEE Journal of Solid-State Circuits, 1979