Characteristics of a-C:H:Si films deposited by r.f. sputtering under various deposition conditions
- 30 April 1994
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 3 (4-6) , 547-550
- https://doi.org/10.1016/0925-9635(94)90221-6
Abstract
No abstract availableKeywords
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