The adsorption and bonding of chlorine at silicon (100) investigated using ESD/ESDIAD with Cl+ and Cl− ions
- 10 June 1996
- journal article
- Published by Elsevier in Surface Science
- Vol. 356 (1-3) , 75-91
- https://doi.org/10.1016/0039-6028(96)00011-8
Abstract
No abstract availableKeywords
This publication has 38 references indexed in Scilit:
- Photon-Stimulated Desorption Mechanism of Cl+Ions from Cl/Si(111) SurfaceJapanese Journal of Applied Physics, 1994
- Si(100)2×1-Cl structure from x-ray-absorption spectroscopyPhysical Review B, 1993
- Chlorine bonding sites and bonding configurations on Si(100)–(2×1)The Journal of Chemical Physics, 1993
- Electronic structure of silicon surfaces: Clean and with ordered overlayersCritical Reviews in Solid State and Materials Sciences, 1991
- Electronic structure of Si(100)2×1-Cl studied with angle-resolved photoemissionPhysical Review B, 1990
- ESDIAD of first-row protic hydrides adsorbed on silicon(100): structure and reactivityLangmuir, 1988
- A review of the halogen adsorption process on metal surfacesCritical Reviews in Solid State and Materials Sciences, 1987
- Two-dimensional ordering of chlorine on Ag(100)Physical Review B, 1985
- Self-consistent electronic structure of the chlorine-adsorbed silicon (111) surfacePhysical Review B, 1978
- Chlorine chemisorption on silicon and germanium surfaces: Photoemission polarization effects with synchrotron radiationPhysical Review B, 1977