Photolysis of group III (Al, Ga, In) trimethyl compounds: Detection of organic photofragments CH3 and C2H6 by picosecond laser mass spectroscopy
- 22 March 1991
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 178 (2-3) , 197-203
- https://doi.org/10.1016/0009-2614(91)87056-h
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Laser photolysis of trimethylgallium at 193 nm: Quantum yields for methyl radical and ethane productionChemical Physics Letters, 1990
- UV excimer laser photochemistry of gaseous and surface adsorbed organometallicsJournal of Crystal Growth, 1988
- Tunable Uv Laser Photolysis of Organometallic Compounds with Product Detection by Laser Mass SpectroscopyMRS Proceedings, 1988
- Investigation of the surface photochemical basis for metal film nucleation in laser chemical vapor depositionApplied Physics Letters, 1985
- Pulsed visible laser photolyis of B(C2H5)3, Al2(CH3)6, Ga(CH3)3, and In(CH3)3: Multiphoton ionization spectra of Al, Ga, and In atomsThe Journal of Chemical Physics, 1983
- Photodeposition of aluminum oxide and aluminum thin filmsApplied Physics Letters, 1983
- Photodeposition of metal films with ultraviolet laser lightJournal of Vacuum Science and Technology, 1982
- Laser-initiated metal deposition on GaAs substratesPhysics Letters A, 1981
- Laser photodeposition of metal films with microscopic featuresApplied Physics Letters, 1979
- Anisotropic Photodissociation of Cadmium DimethylThe Journal of Chemical Physics, 1971