The effect of ambients on the charge density and carrier mobility in a silicon-silicon dioxide interface
- 1 March 1965
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 8 (3) , 313-319
- https://doi.org/10.1016/0038-1101(65)90147-4
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Design calculations for MOS field effect transistorsIEEE Transactions on Electron Devices, 1964
- Rates of Formation of Thermal Oxides of SiliconJournal of the Electrochemical Society, 1964
- Growth and Structure of Si Oxide Films on Si SurfaceJapanese Journal of Applied Physics, 1963
- An investigation of surface states at a silicon/silicon oxide interface employing metal-oxide-silicon diodesSolid-State Electronics, 1962
- Stabilization of Silicon Surfaces by Thermally Grown Oxides*Bell System Technical Journal, 1959