Multiple-exposure holographic lithography with phase shift
- 1 November 2004
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 85 (18) , 4184-4186
- https://doi.org/10.1063/1.1813644
Abstract
We demonstrated a multiple-exposure holographiclithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.Keywords
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