The release of some non-gaseous fission products from CaF2, UO2 and ThO2
- 31 August 1967
- journal article
- Published by Elsevier in Journal of Nuclear Materials
- Vol. 23 (2) , 209-221
- https://doi.org/10.1016/0022-3115(67)90066-9
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Xenon migration and trapping in doped ThO2Journal of Nuclear Materials, 1967
- Location of Inert Gas Atoms in KCl, CaF2, and UO2 Crystals by H+ and He2+ ``Channeling'' StudiesJournal of Applied Physics, 1967
- Diffusion in Doped UO2Nuclear Applications, 1966
- Migration of Xenon through a UO2 Matrix Containing Trapping SitesNuclear Applications, 1966
- Diffusion of non Volatile Fission Products in UO2 and ThO2 as Determined by Leaching into Molten SaltsRadiochimica Acta, 1965
- Notizen: Diffusion of Non-Gaseous Fission Products in UO2 Single CrystalsZeitschrift für Naturforschung A, 1964
- CaF2 als modellsubstanz für diffusionsvorgänge in UO2Journal of Nuclear Materials, 1964
- Xenon diffusion in UO2: some complicating factorsJournal of Nuclear Materials, 1964
- Notizen: Diffusion drei- und vierwertiger Spaltprodukt-Ionen in UO2Zeitschrift für Naturforschung A, 1961
- Notizen: Diffusion von Xe-133 in Uranoxyd verschiedenen SauerstoffgehaltesZeitschrift für Naturforschung A, 1959