Characterization of the Growth of an Oxidation Precursor at Low Temperature on Ofhc Copper
- 1 January 1989
- book chapter
- Published by Elsevier
- Vol. 48, 625-632
- https://doi.org/10.1016/s0167-2991(08)60723-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Reflectance spectroscopy (UV-Vis-NIR, FTIR) of oxide films. Oxide layers on copper and nickelSurface and Interface Analysis, 1988
- Characterization of oxide layers on copper by linear potential sweep voltammetryJournal of Applied Electrochemistry, 1986
- THE OXIDATION OF COPPER FILMS TO CuO0.67The Journal of Physical Chemistry, 1962
- Low Temperature Oxidation of Copper. I. Physical Mechanism1aJournal of the American Chemical Society, 1950