Photoluminescence measurements on erbium-doped silicon
- 1 May 1995
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 10 (5) , 666-671
- https://doi.org/10.1088/0268-1242/10/5/016
Abstract
Photoluminescence measurements of erbium-doped float-zone silicon, Czochralski-grown silicon and silicon oxide are reported. A striking similarity between the spectra of the latter two (oxygen-containing) materials is established. The structure of the spectra can be understood as due to the appearance of phonon replicas together with crystal-field-induced splitting. At higher temperatures an anti-Stokes line and so-called hot lines were observed. The analysis is consistent with the model of erbium impurities which are surrounded by oxygen atoms on nearest-neighbour positions in an arrangement with cubic and/or lower symmetry.Keywords
This publication has 12 references indexed in Scilit:
- Temperature dependence and quenching processes of the intra-4fluminescence of Er in crystalline SiPhysical Review B, 1994
- PL and EPR Studies of Er-Implanted FZ- and CZ-SiMaterials Science Forum, 1993
- Local structure of 1.54-μm-luminescence Er3+ implanted in SiApplied Physics Letters, 1992
- Dopant Enhancement of the 1.54 µm Emission of Erbium Implanted in SiliconMaterials Science Forum, 1992
- Local structure around Er in silica and sodium silicate glassesJournal of Non-Crystalline Solids, 1991
- Optical doping of waveguide materials by MeV Er implantationJournal of Applied Physics, 1991
- Characteristics of rare-earth element erbium implanted in siliconApplied Physics Letters, 1989
- The optical properties of luminescence centres in siliconPhysics Reports, 1989
- Photoluminescence excitation measurements on GaAs:Er grown by molecular-beam epitaxyJournal of Applied Physics, 1987
- Incorporation of erbium in GaAs by liquid-phase epitaxyJournal of Applied Physics, 1987