Process dependence on two-capacitor matching properties with different etching technique
- 1 January 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 39 (2) , 453-454
- https://doi.org/10.1109/16.121708
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Precision measurement technique of integrated MOS capacitor mismatching using a simple on-chip circuitIEEE Transactions on Electron Devices, 1986
- Matching properties, and voltage and temperature dependence of MOS capacitorsIEEE Journal of Solid-State Circuits, 1981
- All-MOS charge redistribution analog-to-digital conversion techniques. IIEEE Journal of Solid-State Circuits, 1975
- All-MOS charge-redistribution analog-to-digital conversion techniques. IIIEEE Journal of Solid-State Circuits, 1975