Density of amorphous silicon films
- 1 November 1973
- journal article
- letter
- Published by Springer Nature in Czechoslovak Journal of Physics
- Vol. 23 (11) , 1273-1276
- https://doi.org/10.1007/bf01591210
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Physical properties of sputtered amorphous Ge: The role of the deposition rateCzechoslovak Journal of Physics, 1972
- Density measurements of thin germanium films by total reflection of X-raysCzechoslovak Journal of Physics, 1972
- Structure of amorphous semiconductorsJournal of Non-Crystalline Solids, 1972
- Elastic and Anelastic Behavior of Ion-Implanted SiliconApplied Physics Letters, 1972
- Structural model for amorphous silicon and germaniumJournal of Non-Crystalline Solids, 1971
- Electronic Dielectric Constant of Amorphous SemiconductorsPhysical Review Letters, 1970
- Properties of glow-discharge deposited amorphous germanium and siliconJournal of Non-Crystalline Solids, 1970
- Evidence of Voids Within the As-Deposited Structure of Glassy SiliconPhysical Review Letters, 1969
- Smoothing by spline functionsNumerische Mathematik, 1967