Thin film atomic layer deposition equipment for semiconductor processing
Top Cited Papers
- 1 January 2002
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 402 (1-2) , 248-261
- https://doi.org/10.1016/s0040-6090(01)01678-9
Abstract
No abstract availableThis publication has 31 references indexed in Scilit:
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