New results in sublimation growth of the SiC epilayers
- 30 July 1999
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 61-62, 165-167
- https://doi.org/10.1016/s0921-5107(98)00494-2
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Deep Defect Centers in Silicon Carbide Monitored with Deep Level Transient SpectroscopyPhysica Status Solidi (a), 1997
- Measurement of electrophysical properties of silicon carbide epitaxial filmsDiamond and Related Materials, 1994
- Fabrication of SiC epitaxial structures for devices by the method of sublimation in an open systemMaterials Science and Engineering: B, 1992