Nanometer Lithography for Quantum Scale Devices
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Development of nanometric electron-beam lithography system (JBX-5D II)Journal of Vacuum Science & Technology B, 1986
- Ultra-High-Resolution electron-beam lithographyJournal of Electron Microscopy Technique, 1985
- Measurements of electron range and scattering in high voltage e-beam lithographyJournal of Vacuum Science & Technology B, 1985
- Harmonic generation due to hot electrons in surface inversion layersSolid-State Electronics, 1980
- Electron-beam fabrication of 80-Å metal structuresApplied Physics Letters, 1976