Phase stability of ${ZrO}_{2 -}$ ${Al}_{2}$ $O_{3}$ thin films deposited by magnetron sputtering

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15 March 1989

journal article
research article
Published by American Physical Society (APS) in Physical Review B

Vol. 39 (9) , 6234-6237
https://doi.org/10.1103/physrevb.39.6234

Abstract

No abstract available

This publication has 7 references indexed in Scilit:

Stabilization of tetragonal ZrO2 with Al2O3 in reactive magnetron sputtered thin films
Journal of Vacuum Science & Technology A, 1987
Stabilized zirconia–alumina thin films
Journal of Vacuum Science & Technology A, 1986
Crystallization of zirconia films by thermal annealing
Journal of Vacuum Science & Technology A, 1986
Pressure‐Temperature Phase Diagram of Zirconia
Journal of the American Ceramic Society, 1985
Transformation toughening
Journal of Materials Science, 1982
Transformation toughening
Journal of Materials Science, 1982
Use of non-Coulomb H ion backscattering to characterize thick anodized aluminum films
Nuclear Instruments and Methods, 1980