X-ray lithography at the super-ACO storage ring of Orsay(France)
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1) , 229-232
- https://doi.org/10.1016/0167-9317(90)90103-z
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Stress and microstructure in tungsten sputtered thin filmsJournal of Vacuum Science & Technology A, 1989
- Non hydrogenated materials for x-ray masks (Si3N4 and SiC)Microelectronic Engineering, 1987
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974