Process for high rate deposition of Al2O3
- 1 December 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 181 (1-2) , 597-601
- https://doi.org/10.1016/0040-6090(89)90528-2
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- High-rate deposition of Al2O3 films using modified cathodic arc plasma deposition processesJournal of Vacuum Science & Technology A, 1989
- Cathodic arc plasma deposition technologyThin Solid Films, 1988
- Properties of silicon and aluminum oxide thin films deposited by dual ion beam sputteringJournal of Vacuum Science & Technology A, 1987
- Al2O3 films for integrated opticsThin Solid Films, 1986
- Summary Abstract: Properties of ion plated oxide filmsJournal of Vacuum Science & Technology A, 1985
- Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputteringApplied Optics, 1985