Ablation dynamics of silicon based targets in oxygen and nitrogen atmospheres
- 1 April 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 241 (1-2) , 103-108
- https://doi.org/10.1016/0040-6090(94)90407-3
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- The plasma properties of laser-ablated SiO2Journal of Applied Physics, 1992
- Properties of silicon dioxide films prepared by pulsed-laser ablationJournal of Applied Physics, 1992
- Analysis of the plasma expansion dynamics by optical time-of-flight measurementsApplied Surface Science, 1992
- Cu0, Cu+, and Cu2 from excimer-ablated copperJournal of Applied Physics, 1991
- SiO2 thin-film deposition by excimer laser ablation from SiO target in oxygen atmosphereApplied Physics Letters, 1990
- Dynamics of excimer laser ablation of superconductors in an oxygen environmentApplied Physics Letters, 1990
- Characterization of ground-state neutral and ion transport during laser ablation of Y1Ba2Cu3O7−x using transient optical absorption spectroscopyApplied Physics Letters, 1989
- Photoelectric effect under strong irradiationContemporary Physics, 1988