Synthesis of oxides in Si0.5Ge0.5 alloy by high dose oxygen ion implantation
- 20 January 1992
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 12 (1-2) , 199-203
- https://doi.org/10.1016/0921-5107(92)90286-i
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The study of Si0.5Ge0.5 alloy implanted by high dose oxygenNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Novel dielectric/silicon planar structures formed by ion beam synthesisNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- SIMS and 18O tracer studies of the redistribution of oxygen in buried SiO 2 layers formed by high dose implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985