High Resolution Replicas for Electron Microscope Observation and Application to Ion Damage in Silicon
- 1 June 1972
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 43 (6) , 911-914
- https://doi.org/10.1063/1.1685804
Abstract
A high resolution replica technique for observation with the electron microscope has been developed by applying suitable forces during the replica process. The method used allowed the resolution of surface damage structures having dimensions of the order of 40–50 Å, as produced in In‐implanted Si samples.Keywords
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