Improved energy output from discharge pumped ArF and KrCl lasers
- 1 March 1984
- journal article
- Published by Elsevier in Optics Communications
- Vol. 49 (3) , 189-194
- https://doi.org/10.1016/0030-4018(84)90261-x
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Self-developing resist with submicrometer resolution and processing stabilityApplied Physics Letters, 1983
- Improved lasing performance of KrCl excimer laserApplied Physics Letters, 1983
- TEA laser gas mixture optimizationReview of Scientific Instruments, 1982
- Spatially resolved gain measurements in UV preionized homogenous discharge XeCl and KrF lasersApplied Physics Letters, 1981
- Photochemical conversion from methylamine to hydrogencyanide with an arf laser at 193 nmChemical Physics Letters, 1980
- Rare-gas halide avalanche discharge lasersIEEE Journal of Quantum Electronics, 1979
- A novel pre-ionization technique for discharge excited rare gas halide lasersOptics Communications, 1979
- High power uv noble-gas-halide laserfApplied Physics Letters, 1976
- Simple electrode configuration for uv initiated high-power TEA laser dischargesJournal of Applied Physics, 1973