Volatile Amidoalane Compounds for Chemical Vapor Deposition of Aluminum
- 20 August 1998
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 10 (9) , 2323-2325
- https://doi.org/10.1021/cm9803354
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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