MR head wafer fabrication technology: current and future perspectives
- 1 January 1996
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 32 (1) , 25-30
- https://doi.org/10.1109/20.477545
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Effect of deposition conditions on the properties of thin permalloy filmJournal of Vacuum Science & Technology A, 1991
- Image reversal resist for g-line exposure: Chemistry and lithographic evaluation.Journal of Photopolymer Science and Technology, 1989
- The saturation magnetostriction of permalloy filmsJournal of Applied Physics, 1981